- Resolution1.6 nm
- Weight300 g
Product Features
- Up to 900 µm range of motion
- Central aperture of 12.5 mm
- Sub-nm resolution
- Excellent trajectory trueness
- High load capability
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Product Features
Select Model
Quantity
Quick Inquiry
| - | UNIT | nanoSX 800 | nanoSX 800 CAP | nanoSX 800 CAP Digital |
|---|---|---|---|---|
| Part # | – | T-128-00 | T-128-06E | T-128-06D |
| Axis | – | X | X | X |
| Motion in Open Loop (±10%)* | µm | 900 | 900 | 900 |
| Motion in Closed Loop (±0.2%)* | µm | – | 800 | 800 |
| Resolution** | nm | 1.6 | 4 | 4 |
| Dimensions (L x W x H) | mm | 60 x 20 x 60 | 60 x 30 x 75 | 60 x 30 x 75 |
| Weight | g | 300 | 410 | 410 |
*Typical value measured with ENV40 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.
The nanoSX 800 combines the high accuracy and the high speed of a piezo positioning system with a special actuating design for long travel motion. The stage offer a compact design with a height of only 20 mm, outside dimensions of only 60 x 60 mm, and a free center space of 12,5 mm.
The ultra flat design of the stage and the ease to combine the stage to an XY scanning system make the system useful for a wide variety of applications.
Based on the unique bi-directional actuating nanoX design, this series can move high load masses. The design guarantees excellent guidance accuracy without parasitic motion and improves the settling time in an active manner.
The nanoSX 800 can be equipped with a high resolution feedback system for closed-loop control.
Common applications for this stage include high resolution metrology, X and XY scanning, and dynamic positioning. It is available in cryogenic and vacuum compatible versions.