- Weight250 g
Product Features
- Up to 480 µm range of motion
- Sub-nm resolution
- High dynamic performance
- Excellent guidance accuracy
- Central aperture of ⌀ 3 mm
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Product Features
Select Model
Quantity
Quick Inquiry
| - | UNIT | nanoX 400 | nanoX 400 SG | nanoX 400 CAP |
|---|---|---|---|---|
| Part # | – | T-108-20 | T-108-21 | T-108-26 |
| Axis | – | X | X | X |
| Motion Open-Loop (±10%)* | µm | 480 | 480 | 480 |
| Motion Closed-Loop (±0.2%)* | µm | – | 400 | 400 |
| Resolution Open-Loop** | nm | 0.8 | 0.8 | 0.8 |
| Resolution Closed-Loop** | nm | – | 8 | 2 |
| Dimensions (L x W x H) | mm | 52 x 32 x 52 | 52 x 32 x 52 | 52 x 32 x 70 |
| Weight | g | 250 | 270 | 370 |
*Typical value measured with ENV40 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.
The piezo based nanoX 400 is our ultra fast and high load positioning stage. It provides a positioning and scanning range of up to 480 micrometers. The centrally located free aperture allows laser optical applications through the stage. Due to FEA-optimization, the nanoX 400 provides the highest dynamical performance and excellent guiding accuracy. This is accomplished even with high mass loads in a very compact package. The nanoX series is made for nano-positioning tasks in the field of semiconductor, laser & optics and test & measurement.